Design specific variation in pattern transfer by via/contact etch process: full-chip analysis
نویسندگان
چکیده
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Levon Manukyan, Nikolay Khachatryan, Jun-Ho Choy, Hasmik Lazaryan, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, Tetsuya Kamigaki Mentor Graphics Corporation, San Jose, CA, USA 95131 Toshiba Corporation, Corporate Manufacturing Engineering Center, 33 Shinisogocho, Isogo-ku, Yokohama-shi, Kanagawa 235-0017, Japan Toshiba Corporation Semiconductor Company, Advanced Memory Development Center, Kawasaki, Japan
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